德国海德堡激光直写光刻机涉及哪些领域的行业应用？

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德国海德堡 激光直写光刻机DWL 66+

科研用激光直写系统
具有多种直写模块，实现不同精度直写需求
能于结构上进行灰度曝光

DWL 66+激光光刻系统是具经济效益的高分辨率图像产生器，适用于小批量掩模板制作和直写需求。该系统的功能和灵活性使其成为Life Science, Advanced Packaging, MEMS, Micro-Optics, Semiconductor以及所有其他需要微结构应用的刻研工具。DWL 66+的客户群包括全球200多所顶 尖大学和研究机构，许多系统功能是与这些机构合作开发，及先进技术不断改进以增加高分办率：DWL 66+的小结构尺寸为300 nm，提供了高的分辨率，优于或等于研发域中强大的光学光刻系统。

基本的DWL 66+包含创造和分析微结构所需的所有功能。它可以用于掩模板制作或直写在任何涂有光刻胶的平坦材料上，多样化选择可提高灵活性，使系统适用于更多应用域。

The DWL 66+ laser lithography system is a cost-effective, high-resolution image generator suitable for small batch mask production ａnd direct writing requirements.The system＇s functionality ａnd flexibility make it an engraving tool for Life Science, Advanced Packaging, MEMS, Micro-Optics, Semiconductor, ａnd all other applications requiring microstructures.DWL 66 + customer base includes more than 200 world universities ａnd research institutes, many of the system function is to work with these institutions development, ａnd advanced technology continuously improve in order to increase the rate of high office: the smallest structure size of the DWL 66 + is 300 nm, provides high resolution, is better than or equal to the research ａnd development in the field of the most powerful optical lithography system.

The basic DWL 66+ contains all the features needed to create ａnd analyze microstructures.It can be used for masking or written directly on any flat material coated with photoresist. A variety of options improves flexibility ａnd enables the system to be suitable for a wide range of applications.