

网状格栅标样可用于TEM放大倍数的校正,校正放大倍数的范围是80-100,000×。格栅条纹密度达到2000lines/mm,线间距是0.5μm,误差为500nm(500±1%)。
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更新时间:2026/10/14 9:22:10关注度:1439
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网状格栅标样可用于TEM放大倍数的校正,校正放大倍数的范围是80-100,000×。格栅条纹密度达到2000lines/mm,线间距是0.5µm,误差为500nm(500±1%)。
| 500nm Magnification Calibration Diffraction Grating Replica |
| Carbon replica with Au/Pd shadowing on a cross line grating with well-defined trench type grooves. Pitch or "d" spacing for parallel line grating is 500nm. The trench type groove makes it easy to measure the pitch. Typically, cross line grating is used up to 100,000x with 2,000 lines/mm in both directions. Instructions included. Made on a G400, 400 square mesh copper grid. | |
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