
3毫米硅磁盘的两侧有50nm的超低应力氮化硅层(氮化硅),在AFM试验中需要用氮化硅作为背景的试样磁盘中。表面粗糙度为0.65±0.06nm,平均粗糙度(Ra)0.45±0.02nm。
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更新时间:2026/10/14 9:22:22关注度:1377
关键词标签:3mm氮化硅涂层圆盘21555-10,3mm氮化硅涂层磁盘,ted,pella代理商
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![]() Silicon Nitride Blank | PELCO® Silicon Nitride Coated 3mm Disks (blanks)These 3mm silicon disks have a 50nm ultra low stress silicon nitride layer (Si3N4) on both sides and can be used as specimen disks for AFM applications which need a Si3N4 background. Provide smooth background: Surface roughness has RMS (Rg) of 0.65 ±0.06nm which gives a mean roughness (RA) of 0.45 ±0.02nm more information on silicon nitride support films |
Product Specifications
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| 订货编号 | 规格及包装 |
| 21555-10 | 3mm硅磁盘/10片装 |